3M™ CMP Pad Conditioner Brush PB32A-1, 4.25-in dia

3M ID 60020020792
  • Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
  • Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
  • Metal-free, polymer bristles resist corrosion
  • Durable bristles are independently fixed across the brush surface
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Details
  • Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
  • Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
  • Metal-free, polymer bristles resist corrosion
  • Durable bristles are independently fixed across the brush surface
  • 3M™ CMP brush connects easily to polishing tool end effector

Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.

Specifications
Abrasive Material
Nylon Fibers
Abrasive Working Surface
Full Face
Application
CMP
Brand
3M™
Carrier Material
Polycarbonate
CMP Process
Cu (Barrier), Final Buff, W (Buff)
Manufacturing Location
United States
Product Series
PB32A
Product Type
Pad Conditioner Brush