- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
Details
- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
- 3M™ CMP brush connects easily to polishing tool end effector
Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.
Specifications
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|
|
|---|---|
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Abrasive Material
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Nylon Fibers
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Abrasive Working Surface
|
Full Face
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Application
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CMP
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Brand
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3M™
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|
Carrier Material
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Polycarbonate
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|
CMP Process
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Cu (Barrier), Final Buff, W (Buff)
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|
Manufacturing Location
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United States
|
|
Product Series
|
PB32A
|
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Product Type
|
Pad Conditioner Brush
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Resources
