- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
Details
- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Efficient pad cleaning and slurry distribution helps manufacturers enable low cost of ownership
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
- 3M™ CMP brush connects easily to polishing tool end effector
Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.
Specifications
|
|
|
|---|---|
|
Abrasive Material
|
Nylon Fibers
|
|
Abrasive Working Surface
|
Full Face
|
|
Application
|
CMP
|
|
Brand
|
3M™
|
|
Carrier Material
|
Polycarbonate
|
|
CMP Process
|
Cu (Barrier), Final Buff, W (Buff)
|
|
Manufacturing Location
|
United States
|
|
Product Series
|
PB32A
|
|
Product Type
|
Brush
|
Resources
