- Helps to reduce the number of maintenance shutdowns, increasing the potential for lower cost of ownership
- Optimized for extended pad and disk life
- Diamonds secured with both chemical and mechanical bonds for great retention
- Controlled diamond placement and protrusion for consistent and reliable performance through disc life
Details
- Helps to reduce the number of maintenance shutdowns, increasing the potential for lower cost of ownership
- Optimized for extended pad and disk life
- Diamonds secured with both chemical and mechanical bonds for great retention
- Controlled diamond placement and protrusion for consistent and reliable performance through disc life
Highly engineered pad conditioners deliver reliable performance for critical semiconductor CMP applications. Utilizes Sintered Abrasive Technology for excellent diamond retention, with controlled diamond placement and protrusion.
Specifications
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|
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|---|---|
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Abrasive Material
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Nickel-based Alloy with Patterned Diamond
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|
Abrasive Working Surface
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Segmented
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Application
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CMP
|
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Brand
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3M™
|
|
Carrier Material
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304 Stainless Steel
|
|
CMP Process
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Cu (Bulk), PMD/ILD, W (Bulk)
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Diamond Size
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250 micron
|
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Manufacturing Location
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United States
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Product Series
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E3910
|
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Product Type
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Diamond Pad Conditioner
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Resources
